The LSX-500 features a compact Nd:YAG laser that delivers unmatched energy output at 266 nm. With the same rugged form factor as the LSX-213 along with a simple and efficient beam delivery system, the LSX-500 will ablate most materials with superior analytical performance.

• Frequency quadrupled 266nm Q-switched Nd:YAG laser
• >9.0 mJ/pulse laser energy (high density-homogenized beam)
• Wide variety of sample cells to accommodate most sample shapes and sizes
• Uniform high density beam minimizes elemental fractionation seen in other 266 nm systems

The LSX-500 was originally designed as an alternative to shorter wavelength lasers based on a prototype high density 266 nm system with external beam homogenization developed at ETH-Zurich. Based on this system, a commercial version with an internally homogenized beam was developed. The LSX-500 delivers a flat, uniform energy density across all spot sizes, sufficient to ablate difficult materials.

A photomicrograph of 100 micron craters in fused silica shows the ability of the LSX-500 to make excellent quality craters in a material traditionally considered difficult to ablate with a 266 nm laser

Feature Overview

• Frequency quadrupled 266 nm Q-switched Nd:YAG laser
• >9.0 mJ/pulse laser energy (high density)
• Flat-Top energy profile across the beam
• Laser pulse width: < 6 nsec
• Repetition rate: 1-20 Hz Q-switch controlled

Viewing Optics and Video System

• Computer-controlled, continuously adjustable parfocal video microscope from 60X-600X
• < 10µm optical resolution
• Motorized zoom video camera
• Fiber optic illuminators for upper and lower lighting
• Reflected and transmitted light illumination
• Computer controlled focusing
• High resolution video image and control on host computer
• Rotating polarized illumination as a standard feature